Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
This paper describes techniques to determine the effective wavelength of x-ray lithography sources. The experimental results give information on the actual x-ray absorption of the resist materials for the x-ray source under test. Results for two beam lines of the HELIOS storage ring installed at the IBM Advanced Lithography Facility, and for one beam line at the VUV ring at the Brookhaven National Laboratory are presented, and compared to calculations. © 1993.
Imran Nasim, Melanie Weber
SCML 2024
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
Ming L. Yu
Physical Review B
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992