Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In this paper we give a description and analysis of a class of matricial difference schemes. This class of schemes is based in part on a generalization of the feature of classical numerical methods of being characterized by approximations at a single point in the complex plane. The schemes introduced here are effective for integrating stiff systems. © 1971 American Mathematical Society.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
M. Tismenetsky
International Journal of Computer Mathematics
Heng Cao, Haifeng Xi, et al.
WSC 2003
George Markowsky
J. Math. Anal. Appl.