Conference paper
High-performance SiGe pMODFETs grown by UHV-CVD
S.J. Koester, R. Hammond, et al.
EDMO 1999
Strained Si devices exhibit enhanced carrier mobility compared to that of standard Si CMOS devices of the same dimensions. Recent strained Si CMOS device results are reviewed. Materials issues related to the strained Si/relaxed SiGe heterostructures required for a strained Si CMOS technology are discussed.
S.J. Koester, R. Hammond, et al.
EDMO 1999
M.A. Tischler, P.M. Mooney, et al.
Journal of Applied Physics
P.M. Mooney, J.A. Ott, et al.
Applied Physics Letters
P.M. Mooney, G.M. Cohen, et al.
MRS Proceedings 2004