PaperInterfacial reaction and schottky barrier in metal-silicon systemsG. Ottaviani, K.N. Tu, et al.Physical Review Letters
PaperEffect of dopant on reaction between polycrystalline silicon and thin-film rhodiumP.A. Psaras, R.D. Thompson, et al.Applied Physics Letters
PaperShallow silicide-to-silicon contacts: The case of amorphous-Pd 80Si20-to-siliconS. Kritzinger, K.N. TuApplied Physics Letters
Conference paperSynchrotron X-ray micro-diffraction analysis on microstructure evolution in Sn under electromigrattonAlbert T. Wu, N. Tamura, et al.MRS Spring Meeting 2005
