M. Pomerantz, J.C. Slonczewski, et al.
Journal of Magnetism and Magnetic Materials
In this review of recent progress in lithography and microscopy by X-rays the authors show how X-ray lithography is used to replicate microcircuit patterns with dimensions below 1 mu m, and how these advances have improved the older technique of X-ray microradiography.
M. Pomerantz, J.C. Slonczewski, et al.
Journal of Magnetism and Magnetic Materials
R.J. Rosser, R. Feder, et al.
Journal of Microscopy
E. Spiller, R.A. McCorkle, et al.
Optical and Optoelectronic Applied Science and Engineering 1990
R.J. Rosser, R. Feder, et al.
Journal of Microscopy