Conference paper
Multilayer mirrors for x-ray lithography
E. Spiller
MRS Spring Meeting 1993
In this review of recent progress in lithography and microscopy by X-rays the authors show how X-ray lithography is used to replicate microcircuit patterns with dimensions below 1 mu m, and how these advances have improved the older technique of X-ray microradiography.
E. Spiller
MRS Spring Meeting 1993
E. Spiller, Alan E. Rosenbluth
Opt. Eng.
L. Golub, A. Quillen, et al.
Proceedings of SPIE 1989
E. Spiller
Applied Optics