D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
Paper
Lithographic image simulations
Abstract
Lithographic aerial images have been studied by digital image simulation. The aspects considered include the variation of numerical aperture, defocus, aberrations, source size, source shape, and source centration. © 1985.
Related
Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R. Ghez, M.B. Small
JES
A. Gangulee, F.M. D'Heurle
Thin Solid Films