Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Liquid immersion deep-ultraviolet interferometric lithography

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An apparatus for deep-ultraviolet interferometric lithography is described, in which the interfering beams illuminate the substrate through a fused silica prism and a layer of index-matching liquid. The liquid-immersion technique was found to be compatible with a commercially available, chemically amplified photoresist. The apparatus was used with a 257 nm light source to write gratings having a period of 97 nm and linewidth of approximately 40 nm. © 1999 American Vacuum Society.