R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
Exposure of surfaces to the reaction products of an rf plasma induces specific aligning properties for smectic and nematic liquid crystals. Oxygen etched indium-tin oxide (ITO) films and surfaces on which SiO2 or SnO2 is deposited show strong parallel alignment. ITO surfaces exposed to a CF4 plasma or surfaces on which a polyfluorocarbon film is deposited by a C2F4 plasma show strong perpendicular alignment. © 1977, The Electrochemical Society, Inc. All rights reserved.
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
R. Ghez, J.S. Lew
Journal of Crystal Growth
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering