Publication
JES
Paper

Liquid Crystal Alignment Produced by RF Plasma Deposited Films

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Abstract

Exposure of surfaces to the reaction products of an rf plasma induces specific aligning properties for smectic and nematic liquid crystals. Oxygen etched indium-tin oxide (ITO) films and surfaces on which SiO2 or SnO2 is deposited show strong parallel alignment. ITO surfaces exposed to a CF4 plasma or surfaces on which a polyfluorocarbon film is deposited by a C2F4 plasma show strong perpendicular alignment. © 1977, The Electrochemical Society, Inc. All rights reserved.

Date

10 Dec 2019

Publication

JES

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