J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system. © 1991.
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering