Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Difference methods for the solution of the semiconductor flow-equations are discussed. It is shown that implicit schemes are best suited for the particular problem. The successive under-relaxation method (SUR) is appropriate for the solution of the implicit equations. Emphasis is placed on the discussion of the computer-code SECUNDA and its applications in a technical development project. Graphical output and computer animation are powerful resultevaluation techniques. Results for the MESFET and for Gunn diodes show the power and flexibility of the approach presented. © 1972.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Kaoutar El Maghraoui, Gokul Kandiraju, et al.
WOSP/SIPEW 2010
Khalid Abdulla, Andrew Wirth, et al.
ICIAfS 2014
Rajiv Ramaswami, Kumar N. Sivarajan
IEEE/ACM Transactions on Networking