Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solutionMoutaz Fakhry, Yuri Granik, et al.SPIE Photomask Technology + EUV Lithography 2011
Conference paperEXAMPLES OF USING THE RESEARCH QUEUEING PACKAGE MODELING ENVIRONMENT (RESQME).Robert F. Gordon, Edward A. MacNair, et al.WSC 1985
PaperConditional generative models for learning stochastic processesSalvatore Certo, Anh Pham, et al.Quantum Machine Intelligence
PaperParallel program schemataRichard M. Karp, Raymond E. MillerJournal of Computer and System Sciences
