John G. Long, Peter C. Searson, et al.
JES
No abstract available.
John G. Long, Peter C. Searson, et al.
JES
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011