Influence of Pt addition on the texture of NiSi on Si(001)

Abstract

The analysis results of Ni 1-xPt xSi films on Si(001) substrates were discussed. The x-ray diffraction in Bragg-Brentano geometry showed that pure NiSi films were randomly oriented, while the addition of Pt was observed to induce an epitaxial alignment. The texture evolution was explained on the basis of expansion of the monosilicide unit cell, caused by the incorporation of Pt. It was observed that NiSi grains exhibited five different types of preferential orientation, with change in the texture of these five components occured due to the addition of an increased amount of Pt. The results of the texture analysis using pole figure measurements show that pure NiSi films are strongly textured.