Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
In this paper we describe coupled channel calculation for atom-surface scattering for arbitrary potentials. We study, for the first time, the effect of the polarization-van der Waals forces. It is concluded that these forces are important for defining the repulsive part of the atom-metal surface potential. We study the He-Ni (110) system and present good agreement with experimental data for energies between 20 and 250 meV. © 1983.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
K.N. Tu
Materials Science and Engineering: A
J. Tersoff
Applied Surface Science
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery