PublicationIEEE T-EDPaperIIIB-5 Fabrication of Thin Gate Oxide MOSFET's Using Low-Temperature Plasma-Enhanced Chemical-Vapor-Deposited SiO2IEEE T-EDView publicationAbstractNo abstract available.Home↳ PublicationsDate01 Jan 1987PublicationIEEE T-EDAuthorsJ. LiJ. BateyE. TierneyIBM-affiliated at time of publicationShare