Robert W. Keyes
IEEE JSSC
Suitably strained silicon exhibits a mobility anisotropy that can be used to advantage in field-effect transistors. The desired strain can be achieved through heteroepitaxy. Copyright © 1986 by The Institute of Electrical and Electronics Engineers, Inc.
Robert W. Keyes
IEEE JSSC
Robert W. Keyes
Physical Review Letters
Robert W. Keyes
Contemporary Physics
Robert W. Keyes
Proceedings of the IEEE