P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Grain growth in vapor-deposited 81 at.% Ni+19 at.% Fe thin films 200 and 400 Å thick in the temperature range 350°-450°C has been investigated by transmission electron microscopy. The results have been interpreted in terms of a previously published model of grain growth in thin films on substrates. The activation energy for grain growth in this alloy has been determined as 1.7±0.2 eV. © 1974.
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
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SPIE AeroSense 1997
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