Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Mixing a symbolic approach to the dynamics of the period-doubling operators, recent results by Sullivan on the renormalization for real analytic maps, and some confidence, a global picture emerges for the structure of the boundary of positive topological entropy in spaces of smooth endomorphisms of the interval. © 1989.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis
Charles A Micchelli
Journal of Approximation Theory