Publication
Journal of Applied Physics
Paper

Geometrical effects in contact resistance measurements: Finite element modeling and experimental results

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Abstract

We find experimentally and calculate by a numerical method the geometrical contribution to resistance due to current bending and constriction in 4-point contact resistance measurements in two configurations: 2I (cross stripes) and 2L. The geometrical effects in thin film couples increase in a 2I and decrease in a 2L with decreasing film thickness/width ratios, rendering the 2L configuration most suitable for interface resistance studies, particularly when the thickness to width ratios are less than 0.5. A set of scaling equations is provided, which enables the application of our results to predict geometrical contributions in these geometries for different materials and dimensions.

Date

01 Dec 1982

Publication

Journal of Applied Physics

Authors

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