Conference paper
Copper contact metallization for 22 nm and beyond
Soon-Cheon Seo, Chih-Chao Yang, et al.
IITC 2009
Oxide breakdown and NBTI are two physical failure mechanisms in ultra-thin gate oxide which continue to generate interest. Ongoing work in these two subjects is needed to ensure the reliability of nano-scale CMOS circuits.
Soon-Cheon Seo, Chih-Chao Yang, et al.
IITC 2009
Miaomiao Wang, X. Miao, et al.
ASICON 2017
Franco Stellari, Peilin Song
IPFA 2005
Miaomiao Wang, Sufi Zafar, et al.
Microelectronic Engineering