Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Measurements on the thermal dissociation of gaseous GeI4 and the reaction of gaseous GeI4 with excess germanium have been made by observing the dependence of the total pressure on temperature for the corresponding closed systems at constant volume. The dependence of equilibrium constant on temperature is given for the reactions Ge(s) + GeI4(g) = 2GeI2(g) and GeI4(g) = GeI2(g) + I2(g) Average heats of reaction and entropy changes are deduced for the temperature range 600°-1200°K. © 1963, The Electrochemical Society, Inc. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011