Martin M. Frank, Glen D. Wilk, et al.
Applied Physics Letters
The gas phase chlorination of hydrogen-passivated silicon Si(111) and Si(100) surfaces was investigated. The structure and stability of chlorine-terminated Si surfaces were investigated using infrared-absorption spectroscopy. It was found that the chlorination process did not change the surface morphology of the H/Si surfaces and HF-etched Si surfaces. It was also observed that Si(100) surfaces were less stable than Si(111) surfaces, but partial Cl termination was found after 15 min with the appearance of SiO 2 phonon modes.
Martin M. Frank, Glen D. Wilk, et al.
Applied Physics Letters
Martin M. Frank, Yu Wang, et al.
JES
Bert De Boer, Martin M. Frank, et al.
Langmuir
Joseph Eng Jr., Krishnan Raghavachari, et al.
Journal of Chemical Physics