PaperEvent monitoring and service in a flat world benefits and challengesThomas M. ChengIT Professional
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
Workshop paperOntologies for specifying and reconciling contexts of web servicesS. Sattanathan, N.C. Narendra, et al.CONTEXT 2005