Paper
X‐ray lithography
R. Feder, E. Spiller, et al.
Polymer Engineering & Science
A novel flash X‐ray source, the gas jet plasma source, has been used for contact X‐ray microscopy. Using a wavelength range of 2–7 nm a resolution of the order of 30 nm can be obtained. The gas jet plasma source provides a new and unique tool which should allow future imaging of wet live cells. 1984 Blackwell Science Ltd
R. Feder, E. Spiller, et al.
Polymer Engineering & Science
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Nuclear Instruments and Methods In Physics Research
R.J. Rosser, R. Feder, et al.
Journal of Microscopy
R.A. McCorkle, J. Angilello, et al.
Science