Publication
JES
Paper

Factors Affecting the Molybdenum Line Slope by Reactive Ion Etching

View publication

Abstract

Factors affecting the slope of the reactive ion etched molybdenum line have been studied with a simulation method and with experiments. Plasma chemistry and process parameters of the CF4/O2 mixture for the molybdenum etch have been examined. The theoretical calculation matches experimental results. Surface topography and composition of the etched molybdenum have been analyzed. A highly sloped molybdenum profile can be obtained by using the RIE method with a large process window. © 1990, The Electrochemical Society, Inc. All rights reserved.

Date

07 Dec 2019

Publication

JES

Authors

Topics

Share