Excimer laser projection photoetching

M.R. Latta; R. Moore; S. Rice; K. Jain

doi:10.1063/1.333923

Journal of Applied Physics

Paper

01 Jan 1984

Excimer laser projection photoetching

View publication

Abstract

Direct photoetching of various resists and polymers with a 193-nm ArF excimer laser has been demonstrated by imaging a mask through a projection lens. Feature sizes ranging from 2 to 20 μm have been cleanly etched in 1-μm-thick films.

Paper

EXCIMER LASER PROJECTION LITHOGRAPHY ON A FULL-FIELD SCANNING PROJECTION SYSTEM.

R.T. Kerth, K. Jain, et al.

IEEE Electron Device Letters

Conference paper

Optical recording in the blue using a frequency-doubled diode laser

W.J. Kozlovsky, A.G. Dewey, et al.

SPIE Optical Data Storage Topical Meeting 1992

Paper

Direct high-resolution excimer laser photoetching

S. Rice, K. Jain

Applied Physics A Solids and Surfaces

Conference paper

Measurement of polarization components using a pour detector polarimeter

M.R. Latta, S.L. Heesacker

Proceedings of SPIE 1989

View all publications

Abstract

Related

EXCIMER LASER PROJECTION LITHOGRAPHY ON A FULL-FIELD SCANNING PROJECTION SYSTEM.

Optical recording in the blue using a frequency-doubled diode laser

Direct high-resolution excimer laser photoetching

Measurement of polarization components using a pour detector polarimeter