Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
PaperBest L1 approximation by weak chebyshev systems and the uniqueness of interpolating perfect splinesCharles A MicchelliJournal of Approximation Theory
Conference paperCharacterization of photoresist spatial resolution by interferometric lithographyJohn A. Hoffnagle, William D. Hinsberg, et al.Microlithography 2003
Conference paperSingle-shot General Hyper-parameter Optimization for Federated LearningYi Zhou, Parikshit Ram, et al.ICLR 2023
