Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Using an algorithm to analyze opportunistically collected mobile phone location data, the authors estimate weekday and weekend travel patterns of a large metropolitan area with high accuracy. © 2011 IEEE.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Alessandro Morari, Roberto Gioiosa, et al.
IPDPS 2011
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
N.K. Ratha, A.K. Jain, et al.
Workshop CAMP 2000