Electrostatic wafer chuck for electron beam microfabrication

Abstract

Vacuum wafer chucks are useless for electron beam microfabrication. An analysis of the required electrostatic forces and frequency response of a specimen wafer on a field plate is made. An experimental electrostatic chuck and its high voltage square wave power supply have been fabricated. Full clamping action has been provided by electrostatic pressures of 1/6 atm, and 1 atm pressures are feasible. In-vacuum operation is excellent down to supply frequencies of 0.01Hz. © 1973 The American Institute of Physics.