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JES
Paper

Electrical Properties of Al/Ti Contact Metallurgy for VLSI Application

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Abstract

The metallization systems Al/Ti (and Si/Al/Ti) were studied as contact metallurgies applied to N+ silicon with contact size around 1 μm2 and junction depth as shallow as 0.1 /[m. Electrical test results show that contact resistivity is much lower than that provided by Pd2Si contact metallurgy, ranging from low 10–6 to middle 10–7 Ω-cm2 depending on the surface dopant concentration. Junction leakage is extremely low and does not show significant degradation after 5 hr annealing at 400°C or 30 min annealing at 450°C. Contact resistance of 15 Ω per contact has been achieved on 1 μm2 size contacts. © 1982, The Electrochemical Society, Inc. All rights reserved.

Date

09 Dec 2019

Publication

JES

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