The DX centre
T.N. Morgan
Semiconductor Science and Technology
This paper briefly reviews literature on the effects of major materials and testing parameters on the corrosion rates of Al conductor lines in contact with phosphosilicate glass layers in integrated circuits. In an effort to assess the relative importance of these parameters on Al corrosion, selected literature findings are combined into a generalized rate equation that can be used to estimate Al conductor lifetimes under a wide range of conditions and to guide in the development of future experiments to address this highly complex problem more precisely. Al corrosion mechanisms and polarity effects are also briefly discussed. © 1982, The Electrochemical Society, Inc. All rights reserved.
T.N. Morgan
Semiconductor Science and Technology
J. Tersoff
Applied Surface Science
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Michiel Sprik
Journal of Physics Condensed Matter