I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
The Helios compact synchrotron installed at IBM's Advanced Lithography Facility provides a unique opportunity to obtain compact synchrotron reliability data in an industrial environment. This paper presents data from the first eight months of user oriented operation of the machine. Running and uptime statistics are tabulated, as well as achieved performance parameters. Unscheduled downtime in the various subsystems is described. © 1993.
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993