Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The Helios compact synchrotron installed at IBM's Advanced Lithography Facility provides a unique opportunity to obtain compact synchrotron reliability data in an industrial environment. This paper presents data from the first eight months of user oriented operation of the machine. Running and uptime statistics are tabulated, as well as achieved performance parameters. Unscheduled downtime in the various subsystems is described. © 1993.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications