Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Robert G. Farrell, Catalina M. Danis, et al.
RecSys 2012
Leo Liberti, James Ostrowski
Journal of Global Optimization
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007