DNA sequencing on a chip

G.M. Wallraff; T. Nguyen; Jeff W. Labadie; T. Huynh; P.J. Brock; W.D. Hinsberg; Richard DiPietro; G. McGall

Paper

01 Feb 1997

DNA sequencing on a chip

Abstract

This method, which combines semiconductor manufacturing technology with molecular biology, has been used to build DNA and RNA arrays at densities as high as 10 6 sites/cm 2.

Paper

Progress in 193 nm positive resists

R.D. Allen, R. Soortyakumaran, et al.

J. Photopolym. Sci. Tech.

Conference paper

The effect of photoresist/topcoat properties on defect formation in immersion lithography

G.M. Wallraff, Carl E. Larson, et al.

Proceedings of SPIE 2007

Conference paper

Poly(quinoxalones): Synthesis and properties

Jeff W. Labadie

ACS PMSE 1988

Paper

Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions

W.D. Hinsberg, F.A. Houle, et al.

J. Photopolym. Sci. Tech.

View all publications

Abstract

Related

Progress in 193 nm positive resists

The effect of photoresist/topcoat properties on defect formation in immersion lithography

Poly(quinoxalones): Synthesis and properties

Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions