Conference paper
Polysilanes. Radiation sensitive materials for microlithography
R.D. Miller
ACS Division of Polymer Chemistry Washington DC Meeting 1990
No abstract available.
R.D. Miller
ACS Division of Polymer Chemistry Washington DC Meeting 1990
Cecilia A. Walsh, D.M. Burland, et al.
NLO 1990
R.D. Miller, G.M. Wallraff, et al.
ACS Division of Polymer Chemistry Atlanta Meeting 1991
M. Colburn, S.V. Nitta, et al.
AMC 2003