Cyclic olefm resist polymers and polymerizations for improved etch resistance

R.D. Allen; Juliann Opitz; Hiroshi Ito; Thomas I. Wallow; Daniel V. Casmier; Carl E. Larson; R. Sooriyakumaran; D. Hofer; P.R. Varanasi

doi:10.2494/photopolymer.12.501

J. Photopolym. Sci. Tech.

Paper

01 Jan 1999

Cyclic olefm resist polymers and polymerizations for improved etch resistance

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Abstract

This paper will describe the strengths and unique challenges of building 193nm resists from acrylic polymers and cyclic olefin polymers. In particular, cyclic olefm (alternating) copolymer synthesis and properties will be discussed. ©1999TAPJ.

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