John G. Long, Peter C. Searson, et al.
JES
Photochemical deposition from Cr(CO)6, Mo(CO)6, and W(CO)6 is described for processes induced by a CW frequency-doubled argon ion laser (257 nm) and a pulsed KrF* excimer laser (248 mm). Kinetic data on the deposition process induced by the frequency-doubled argon ion laser indicate that deposition is initiated by single-photon dissociation of the hexacarbonyl in the gas phase. A more qualitative study of projection deposition from W(CO)6 induced by the KrF* laser indicates that gas-phase photodissociation of the hexacarbonyl is also important in the pulsed laser deposition process. © 1989.
John G. Long, Peter C. Searson, et al.
JES
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
J.A. Barker, D. Henderson, et al.
Molecular Physics
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007