CW and pulsed UV laser-induced deposition from Cr(CO)₆, Mo(CO)₆, and W(CO)₆

Abstract

Photochemical deposition from Cr(CO)6, Mo(CO)6, and W(CO)6 is described for processes induced by a CW frequency-doubled argon ion laser (257 nm) and a pulsed KrF* excimer laser (248 mm). Kinetic data on the deposition process induced by the frequency-doubled argon ion laser indicate that deposition is initiated by single-photon dissociation of the hexacarbonyl in the gas phase. A more qualitative study of projection deposition from W(CO)6 induced by the KrF* laser indicates that gas-phase photodissociation of the hexacarbonyl is also important in the pulsed laser deposition process. © 1989.