Conference paper
Copper contact metallization for 22 nm and beyond
Soon-Cheon Seo, Chih-Chao Yang, et al.
IITC 2009
In spite of 50 years of history, there is still no consensus on the basic physics of Negative Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric, currently vie for dominance. The differences appear fundamental: one model holds that NBTI is a diffusion-limited process and the other holds that it is reaction-limited. Basic issues of disagreement are summarized and the main controversial aspects of each model are reviewed and contrasted.
Soon-Cheon Seo, Chih-Chao Yang, et al.
IITC 2009
Miaomiao Wang, X. Miao, et al.
ASICON 2017
Ernest Y. Wu, James H. Stathis, et al.
Semiconductor Science and Technology
Peter E. Blöchl, James H. Stathis
Physical Review Letters