S.R. Herd, K.Y. Ahn, et al.
Thin Solid Films
Reactions between Si and thin films of rare-earth metals (Gd, Dy, Ho, Er, plus Y and La) in the temperature range of 275-900°C have been studied by using x-ray diffraction and ion backscattering spectrometry. The disilicides of these metals are apparently the first phase to form, forming rapidly within a narrow temperature range (325-400°C), and are stable up to 900°C. The growth does not follow a layered growth mode.
S.R. Herd, K.Y. Ahn, et al.
Thin Solid Films
Albert T. Wu, J.R. Lloyd, et al.
APM 2005
R.S. Liu, S.Y. Lin, et al.
Physica C: Superconductivity and its applications
K.N. Tu, K.Y. Ahn, et al.
Applied Physics Letters