B.Z. Weiss, K.N. Tu, et al.
Scripta Metallurgica
Reactions between Si and thin films of rare-earth metals (Gd, Dy, Ho, Er, plus Y and La) in the temperature range of 275-900°C have been studied by using x-ray diffraction and ion backscattering spectrometry. The disilicides of these metals are apparently the first phase to form, forming rapidly within a narrow temperature range (325-400°C), and are stable up to 900°C. The growth does not follow a layered growth mode.
B.Z. Weiss, K.N. Tu, et al.
Scripta Metallurgica
K.N. Tu
Journal of Applied Physics
P.A. Psaras, M. Eizenberg, et al.
Journal of Applied Physics
O. Bisi, L.W. Chiao, et al.
Surface Science