Publication
CS MANTECH 2017
Conference paper

Comparison of charge dissipation layers and dose sensitivity of PMMA electron beam lithography on transparent insulating substrates such as GaN

Abstract

We compare the influence of electron-beam and thermal evaporation of a charge dissipation layer on the edge roughness and dose-sensitivity of polymethyl methacrylate (PMMA) in an electron-beam lithography (EBL) process on semi-insulating GaN. It is shown that the deposition of the Aluminum film with an electron-beam process leads to an increased sensitivity of the PMMA to small dose variations and a more than three times higher edge roughness compared to a thermally deposited Aluminum layer. The study has direct bearing on the manufacturability of mm-wave devices on GaN.

Date

22 May 2017

Publication

CS MANTECH 2017

Authors

Share