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SPIE Photomask Technology + EUV Lithography 2011
In this paper various ways of constructing locally supported fundamental splines leading to highly accurate local interpolation schemes are proposed and analyzed. © 1988 Springer-Verlag.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
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SICON
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