R. Ghez, J.S. Lew
Journal of Crystal Growth
A critical review of the oxygen-aluminum system is presented. The primary emphasis concerns the electronic properties of aluminum surfaces exposed to oxygen. The chemisorption and oxidation aspects are considered. Cluster and slab model calculations are discussed fully and the results are related to relevant experimental data. Some of the unresolved issues are listed. A comprehensive guide to the oxygen-aluminum literature is provided. © 1984.
R. Ghez, J.S. Lew
Journal of Crystal Growth
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