C. Engström, J. Birch, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The (buried) interface between a polycrystalline Al thin-film feature and its substrate (single crystal Si) was characterized with x-ray microdiffraction. Using a focused x-ray beam (effective spot size on the specimen ∼2×12 μm) with the Si 004 reflection, topographic images of the Si around and under the metallization feature were constructed. Comparison with shear-lag model calculations indicate that the interface is not fully coupled despite the absence of surface cracks. © 1998 American Institute of Physics.
C. Engström, J. Birch, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
G.A. Held, J.L. Jordan-Sweet, et al.
Physical Review Letters
D. Chidambarrao, Y.C. Song, et al.
Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science
V. McGahay, G. Bonilla, et al.
IITC 2006