About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Microelectronic Engineering
Paper
Characterization of stress in the absorber of x-ray masks using a holographic technique
Abstract
The distortion of X-ray masks is directly related to the stress of the absorber used. Because of this, it is very important be able to determine the value of the absorber stress in order to be able to control, or reduce, the distortion of the masks. A simple technique, double exposure holographic interferometry, is described. Its application in measuring the stress of electrodeposited gold films, and the effect that several deposition parameters have on the gold stress are described. © 1985.