Massimo V. Fischetti
IEEE T-ED
Using a Monte Carlo method, we investigate hole transport in ultrasmall p-channel Si MOSFETs with gate lengths of 25 nm. The device simulator couples a 2D Poisson solver with a discretized 6 × 6 k.p Hamiltonian solver that includes the effect of the confining potential and provides the subband structure in the channel region. In addition, carriers in the source and drain regions are treated as quasi 3D particles and the band-structure information is included by solving for the eigenenergies of a more compact 6 × 6 k.p Hamiltonian. © 2005 Springer Science + Business Media, Inc.
Massimo V. Fischetti
IEEE T-ED
Min Yang, Victor W.C. Chan, et al.
IEEE Transactions on Electron Devices
Santhosh Krishnan, Dragica Vasileska, et al.
Microelectronics Journal
Massimo V. Fischetti, D.J. Dimaria
Physical Review Letters