Proceedings of SPIE 1989
Conference paper

B-Si masks for storage ring x-ray lithography

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The fabrication of masks used in storage ring X-ray lithography is described. These masks consist of a gold absorber electroplated over a substrate formed by a thin boron-doped silicon membrane covered by a layer of polyimide. Measurement of the properties of the materials which are of concern in this application is also described. © 1984 SPIE.