Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A new ab initio method is introduced for constructing accurate pseudopotentials. A new model is obtained with a simple and realistic analytical expression. This contains explicitly both important characteristics of the atomic observables, namely the regular dependence on the atomic number and the non-locality. The application to the Li-like ions of the first row is presented. The whole spectrum of energy eigenvalues is reproduced within 0.3% and HF wavefunctions within 0.5%. © 1981.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Hiroshi Ito, Reinhold Schwalm
JES
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
K.A. Chao
Physical Review B