Application of automated design migration to alternating phase shift mask design

Abstract

The use of phase shifted mask (PSM) has been demonstrated to be a powerful resolution enhancement technique (RET) for the printing of features at dimensions below the exposure wavelength in deep submicron technologies. Its implementation in physical design has introduced non-conventional design ground rules, which impact the traditional layout migration process and designers' productivity. In this panel discussion paper, we propose a solution to extend the traditional constraint-based layout migration and legalization approach. The solution has been demonstrated to be very effective in practice.