Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Methods developed at the Stanford Synchrotron Radiation Laboratory for obtaining high quality polycrystalline diffraction patterns are described. Any wavelength from about 0.5 to 2 A can be selected from the high intensity parallel beam source. The X-ray optics includes an incident beam silicon (111) channel monochromator and long parallel slits with 0.05º aperture to define the diffracted beams. Patterns with a selected wavelength are recorded with θ:2θ scanning or with fixed specimen and 2θ detector scanning; the wavelength can be chosen at will. The high resolution single profiles have the same shape in the entire pattern except for the width which increases with tanθ. They are fitted with a pseudo Voigt function (75% G 4-25 %L) to resolve overlaps and derive integrated intensities. High resolution energy dispersive diffraction patterns are made with the same instrumentation and a scintillation counter by step scanning the monochromator. A number of methods and new applications that have been developed are briefly described. © 1987, by R. Oldenbourg Verlag
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
T.N. Morgan
Semiconductor Science and Technology
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics