About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Journal of Adhesion Science and Technology
Paper
Adhesion and interface studies between copper and polyimide
Abstract
The adhesion and interface structure between copper and polyimide have been studied. Polyimide films were prepared by spinning a polyamic acid solution (Du Pont PMDA-ODA) in an NMP solvent onto a Cu foil, followed by thermal curing up to 400°C. The adhesion strength was measured by a 90° peel test. The peel strength of 25 μm thick Cu foil to 25 μm thick polyimide substrate was about 73 g/mm with the peel strength decreasing with increasing polyimide thickness. Cross-sectional TEM observation revealed very fine Cu-rich particles distributed in the polyimide. Particles were not found closer than 80-200 nm from Cu boundary. These Cu-rich particles were formed as a result of reaction of polyamic acid with Cu during thermal curing. We attribute the high peel strength to interfacial chemical bonding between Cu and polyimide. This behavior is in contrast to vacuum-deposited Cu onto fully cured polyimide. © VSP 1987.